Publication Beamlines Strategic Pillar
Hu, Y.F.; Piao, H.; Fronheiser, J.; Matocha, K. (2011). Chemical characterization of SiO2/SiC interface after nitridation treatment. Journal of Electron Spectroscopy and Related Phenomena 184(3-6) , 245-248. 10.1016/j.elspec.2010.09.005. SXRMB
Kim, BoHoon; Mourhatch, Ramoun; Aswath, Pranesh B. (2010). Properties of tribofilms formed with ashless dithiophosphate and zinc dialkyl dithiophosphate under extreme pressure conditions. Wear 268(3-4) , 579-591. 10.1016/j.wear.2009.10.004. SGM, SXRMB, VLS-PGM Materials
Kim, BoHoon; Mourhatch, Ramoun; Aswath, Pranesh B. (2010). Properties of tribofilms formed with ashless dithiophosphate and zinc dialkyl dithiophosphate under extreme pressure conditions. Wear 268(3-4) , 579-591. 10.1016/j.wear.2009.10.004. SGM, SXRMB, VLS-PGM Materials
Kim, BoHoon; Mourhatch, Ramoun; Aswath, Pranesh B. (2010). Properties of tribofilms formed with ashless dithiophosphate and zinc dialkyl dithiophosphate under extreme pressure conditions. Wear 268(3-4) , 579-591. 10.1016/j.wear.2009.10.004. SGM, SXRMB, VLS-PGM Materials
Kuneš, J.; Baldassarre, L.; Schächner, B.; Rabia, K.; Kuntscher, C. A. et al. (2010). Metal-insulator transition inNiS2−xSex. Physical Review B - Condensed Matter and Materials Physics 81(3) . 10.1103/physrevb.81.035122. SXRMB
Lee, Kee Eun; Gomez, Mario A.; Regier, Tom; Hu, Yongfeng; Demopoulos, George P. et al. (2011). Further Understanding of the Electronic Interactions between N719 Sensitizer and Anatase TiO2 Films: A Combined X-ray Absorption and X-ray Photoelectron Spectroscopic Study. Journal of Physical Chemistry C 115(13) , 5692-5707. 10.1021/jp109869z. SGM, SXRMB
Lee, Kee Eun; Gomez, Mario A.; Regier, Tom; Hu, Yongfeng; Demopoulos, George P. et al. (2011). Further Understanding of the Electronic Interactions between N719 Sensitizer and Anatase TiO2 Films: A Combined X-ray Absorption and X-ray Photoelectron Spectroscopic Study. Journal of Physical Chemistry C 115(13) , 5692-5707. 10.1021/jp109869z. SGM, SXRMB
Li, Y.S.; Pan, T.J.; Tang, Y.; Yang, Q.; Hirose, A. et al. (2011). Selective synthesis of diamond and CNT nanostructures directly on stainless steel substrates. Diamond and Related Materials 20(2) , 187-190. 10.1016/j.diamond.2010.11.027. SGM, SXRMB, VESPERS
Li, Y.S.; Pan, T.J.; Tang, Y.; Yang, Q.; Hirose, A. et al. (2011). Selective synthesis of diamond and CNT nanostructures directly on stainless steel substrates. Diamond and Related Materials 20(2) , 187-190. 10.1016/j.diamond.2010.11.027. SGM, SXRMB, VESPERS
Li, Y.S.; Pan, T.J.; Tang, Y.; Yang, Q.; Hirose, A. et al. (2011). Selective synthesis of diamond and CNT nanostructures directly on stainless steel substrates. Diamond and Related Materials 20(2) , 187-190. 10.1016/j.diamond.2010.11.027. SGM, SXRMB, VESPERS
Li, Y.S.; Yang, L.; Tang, Y.; Zhang, C.; Zhang, L. et al. (2011). Adherent nanocrystalline diamond coatings deposited on Ti substrate at moderate temperatures. Surface and Coatings Technology 206(7) , 1971-1976. 10.1016/j.surfcoat.2011.09.077. REIXS, SXRMB, VESPERS
Li, Y.S.; Yang, L.; Tang, Y.; Zhang, C.; Zhang, L. et al. (2011). Adherent nanocrystalline diamond coatings deposited on Ti substrate at moderate temperatures. Surface and Coatings Technology 206(7) , 1971-1976. 10.1016/j.surfcoat.2011.09.077. REIXS, SXRMB, VESPERS
Li, Y.S.; Yang, L.; Tang, Y.; Zhang, C.; Zhang, L. et al. (2011). Adherent nanocrystalline diamond coatings deposited on Ti substrate at moderate temperatures. Surface and Coatings Technology 206(7) , 1971-1976. 10.1016/j.surfcoat.2011.09.077. REIXS, SXRMB, VESPERS
MacDonald, Mark A.; Zhang, Peng; Chen, Ning; Qian, Huifeng; Jin, Rongchao et al. (2010). Solution-Phase Structure and Bonding of Au38(SR)24 Nanoclusters from X-ray Absorption Spectroscopy. Journal of Physical Chemistry C 115(1) , 65-69. 10.1021/jp1102884. HXMA, SXRMB
MacDonald, Mark A.; Zhang, Peng; Chen, Ning; Qian, Huifeng; Jin, Rongchao et al. (2010). Solution-Phase Structure and Bonding of Au38(SR)24 Nanoclusters from X-ray Absorption Spectroscopy. Journal of Physical Chemistry C 115(1) , 65-69. 10.1021/jp1102884. HXMA, SXRMB