Publication Beamlines Strategic Pillar
Wells, Garth; Achenbach, Sven; Klymyshyn, David; Jacobs, Michael; Mazhar, Waqas et al. (2019). High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layers Using Deep X-ray Lithography at SyLMAND. Synchrotron Radiation News 32(4) , 44-47. 10.1080/08940886.2019.1634438. SYLMAND Materials